Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.124-130, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ronse,K. ; Tritchkov,A. ; Randall,J. ; Jonckheere,R. ; Ghandehari,K. ; Van den hove,L.
Pub. info.:
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.138-144, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California. pp.150-158, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
18th Annual BACUS Symposium on Photomask Technology and Management. pp.313-324, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Jonckheere,R. ; Moonens,J. ; Potoms,G. ; Bovie,I. ; Van den hove,L.
Pub. info.:
16th Annual BACUS Symposium on Photomask Technology and Management. pp.290-301, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering