1.

Conference Proceedings
Conference Proceedings
1. 26 Co-silicide, Co(Ni)-silicide and Ni-silicide to source¥drain contact resistance
Akheyar, A. ; Lauwers, A. ; Kitti, J.A. ; De Potter, M ; Chamirian, O. ; Jonckheere, R. ; Leunissen, P. ; van Dal, M ; Lindsay, R. ; Tempel, G. ; Maex, K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.197-204,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]
Lee, -W. S. ; Leunissen, A. H. L. ; Van de Kerhove, J. ; Philipsen, V. ; Jonckheere, R. ; Lee, -J. S. ; Woo, -G. S. ; Cho, -K. H. ; Moon, -T. J.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810U-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
3.

Conference Proceedings
Conference Proceedings
3. Processing Damage and Electrical Performance of Porous Dielectrics in Narrow Spaced Interconnects
Iacopi, F. ; Travaly, Y. ; Stucchi, M. ; Struyf, H. ; Peeters, S. ; Jonckheere, R. ; Leunissen, L.H.A. ; Tokei, Zs. ; Sutcliffe, V. ; Richard, O. ; Hove, M.Van ; Maex, K.
Pub. info.: Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.19-24,  2004.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 812
4.

Conference Proceedings
Conference Proceedings
4. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
5.

Conference Proceedings
Conference Proceedings
5. Status 157-nm lithography development at IMEC
Ronse, K.G. ; Bisschop, P.D. ; Eliat, A. ; Goethals, A.M. ; Hermans, J. ; Jonckheere, R. ; Heuvel, D.V.D. ; Roey, F.V. ; Beckx, S. ; Wouters, J.M. ; Marneffe, J.F. ; O'Neil, T. ; Tirri, B. ; Sewell, H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.640-649,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, V. ; Philipsen, V. ; Jonckheere, R. ; Vandenberghe, G. ; Verhaegen, S. ; Hoffmann, T. ; Ronse, K. ; Howard, W.B. ; Maurer, W. ; Preil, M.E.
Pub. info.: Optical Microlithography XV.  Part One  pp.395-406,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Printability of 2D mask quality
Philipsen, V. ; Jonckheere, R.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.276-286,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]
Philipsen, V. ; Leunissen, L. ; De Ruyter, R. ; Jonckheere, R. ; Marlin, P. ; Wakefield, C. ; Johnson, S. ; Cangemi, M. ; Buxbaum, A. ; Morrison, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.211-222,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
10.

Conference Proceedings
Conference Proceedings
10. Mask topography effect in chromeless phase lithography
Philipsen, V. ; Bekaert, J. ; Vandenberghe, G. ; Jonckheere, R. ; Van Den Broeke, D. ; Socha, R.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.669-679,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567