1.

Conference Proceedings
Conference Proceedings
1. Plasma etching of Cr photomasks:parametric comparisons of plasma sources and process conditions
Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Coleman,T.P. ; Faure,T.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.11-18,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. New optical sensor for real-time in-situ endpoint monitoring during dry etching of III-V ternary multistack layers
Liddane,K.J. ; Benferhat,R. ; Lee,J. ; Westerman,R. ; Johnson,D.J. ; Donohue,J.F. ; Sasserath,J.N. ; Pearton,S.J.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.300-308,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
3.

Conference Proceedings
Conference Proceedings
3. Plasma etching of Cr films in the fabrication of photomasks:II.a comparison of etch technologies and a first look at defects
Coleman,T.P. ; Buck,P.D. ; Johnson,D.J.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.92-102,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
4.

Conference Proceedings
Conference Proceedings
4. Plasma etching of Cr photomasks: optimization of process conditions and CD control
Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Coleman,T.P. ; Faure,T. ; Dubuque,L.F.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.94-103,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
5.

Conference Proceedings
Conference Proceedings
5. Inductively coupled plasma etch of DUV MoSi photomasks:a designed study of etch chemistries and process results
Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Hourd,A.C.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.88-97,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546