A methodology for the characterization of arithmetic circuits on CMOS deep submicron technologies

A methodology for the characterization of arithmetic circuits on CMOS deep submicron technologies

Author(s):

Estrada, A. ( Univ. of Seville (Spain) )
Jimenez, C. J. ( Univ. of Seville (Spain) )
Valencia, M. ( Univ. of Seville (Spain) )

Publication title:

VLSI Circuits and Systems II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5837

Pub. Year:

2005

Page(from):

902

Page(to):

912

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458322 [0819458325]

Language:

English

Call no.:

P63600/5837-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00015070
Series ID:	PA00000029
Conf. info. (Name):	Microtechnologies for the New Millennium : VLSI Circuits and Systems
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Seville, Spain
Conf. info. (Date):	2005.05.09-2005.05.11

Similar Items:

1 Conference Proceedings Partitioning and characterization of high speed adder structures in deep-submicron technologies A. Estrada, G. Sassaw, C. J. Jimenez, M. Valencia SPIE - The International Society of Optical Engineering	7 Conference Proceedings Radiation damage in deep submicron partially depleted SOI CMOS Simoen, E., Rafi, J.M., Mercha, A., Serra-Gallifa, X., van Meer, H., De Meyer, K., Claeys, C., Kokkoris, M., … Electrochemical Society
2 Conference Proceedings Device/Circuit modeling and simulation applied to design of Deep-Submicron SOI CMOS technology Fossum, J.G., Yeh, P.C., Suh, D., Krishnan, S. Electrochemical Society	8 Conference Proceedings Optimisation of Cryogenic CMOS Technology and Design for Deep Cryogenic Analog Circuits Dierickx, B., Simoen, E., Vermeiren, J., Cos, S., Claeys, C., Declerck, G. ESA Publications Division
3 Conference Proceedings Electrical Performance and Reliability Aspects of Strain Engineered Deep Submicron CMOS Technologies C. Claeys, G. Eneman, M. Bargallo Gonzalez, S. Put, E. Simoen Electrochemical Society	9 Conference Proceedings Advanced Device Structures and Technology Issues for Deep Submicron CMOS Pfiester, J.R. Electrochemical Society
4 Conference Proceedings Study of integration issues in shallow trench isolation for deep submicron CMOS technologies Chatterjee,A., Mason,M.E., Joyner,K., Rogers,D., Mercer,D., Kuehne,J., Esquivel,A.L., Mei,P., Murtaza,S.S., Taylor,K.J., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Characterization and Performance Evaluation of an APS Pixel in a Standard 2 um CMOS Technology Mestanza, S. N. M., Rodriguez, E., Jimenez, H. G., Diniz, J. A., Doi, I., Swart, J. W. Electrochemical Society
5 Conference Proceedings SOI Technology for Deep-Submicron CMOS Applications, Colinge, J.-P. Electrochemical Society	11 Conference Proceedings Degradation of Deep Submicron Partially Depleted SOI CMOS iransistors tinder MEV Proton or Gamma Irradiation Simoen, E., Rafi, J.M., Mercha, A., De Meyer, K., Claeys, C., Kokkoris, M., Kossionides, E., Fanourakis, G., … Electrochemical Society
6 Conference Proceedings Effect of argon or nitrogen preamorphized implant on SALICIDE formation for deep submicron CMOS technology Ho,C.S., Pey,K.L., Wong,H., Karunasiri,R.P.G., Chua,S.J., Lee,K.H., Tang,Y., Wong,S.M., Chan,L.H. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Integration of NiSi Salicide for Deep Submicron CMOS Technologies Lin, X. W., Ibrahim, N., Topete, L., Pramanik, D. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12