1.

Conference Proceedings
Conference Proceedings
1. A High Density, Pulsed RF Inductively Coupled Reactor for Sub- Half Micron Etch Applications
Ditizio, R.A. ; Jerde, L.G. ; Zhang, Y. ; Meyer, J.A. ; Zucker, M.L. ; Mantei, T.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.89-95,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. PZT stack etch for MEMS devices in a capacitively coupled high-density plasma reactor
Werbaneth, P.F. ; Almerico, J. ; Jerde, L.G. ; Marks, S.
Pub. info.: Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia.  pp.267-273,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4592