1.

Conference Proceedings
Conference Proceedings
1. Comparison of at-wavelength inspection,printability,and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography(EUVL)
Cardinale,G.F. ; Goldsmith,J.E.M. ; Ray-Chaudhuri,A.K. ; Fisher,A. ; Hector,S.D. ; Mangat,P.J.S. ; Masnyj,Z.S. ; Mancini,D.P. ; Wilkinson,B. ; Bokor,J. ; Jeong,S. ; Burkhart,S.C. ; Cerjan,C.J. ; Walton,C.C. ; Yan,P. ; Zhang,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.429-439,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Nondestructive picosecond ultrasonic characterization of Mo/Si multilayers using a novel pump-probe scheme
Pu,N.-W. ; Jeong,S. ; Zhao,R.-A. ; Bokor,J.
Pub. info.: 18th Congress of the International Commission for Optics : Optics for the next millennium : 2-6 August, 1999, San Francisco, California.  pp.196-197,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3749
3.

Conference Proceedings
Conference Proceedings
3. Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet Lithography
Jeong,S. ; Lai,C.-W. ; Rekawa,S. ; Walton,C.C. ; Prisbrey,S.T. ; Bokor,J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.814-821,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings
Conference Proceedings
4. Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography
Pu,N.-W. ; Jeong,S. ; Zhao,R.-A. ; Bokor,J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.627-634,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
5.

Conference Proceedings
Conference Proceedings
5. Mask technology for EUV lithography
Bujak,M. ; Burkhart,S.C. ; Cerjan,C.J. ; Kearney,P.A. ; Moore,C.E. ; Prisbrey,S. ; Sweeney,D.W. ; Tong,W.M. ; Vernon,S.P. ; Walton,C.C. ; Warrick,A.L. ; Weber,F.J. ; Wedowski,M. ; Wilhelmsen,K.C. ; Jeong,S. ; Cardinale,G.F. ; Ray-Chaudhuri,A.K. ; Stivers,A.R. ; Tenjil,E.
Pub. info.: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.30-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3665
6.

Conference Proceedings
Conference Proceedings
6. Area scanning vision inspection system by using mirror control
Jeong,S. ; Min,S. ; Yang,W.
Pub. info.: Optomechatronic systems : 5-6 November 2000, Boston, USA.  pp.149-159,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4190
7.

Conference Proceedings
Conference Proceedings
7. Actinic defect counting statistics over 1-cm2 area of EUVL mask blank
Jeong,S. ; Lai,C.-W. ; Rekawa,S. ; Walton,C.C. ; Bokor,J.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.431-440,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
8.

Conference Proceedings
Conference Proceedings
8. New applications of fluorescence polarization for enzyme assays and in genomics
Nikiforov,T.T. ; Coffin,J. ; Jeong,S. ; Simeonov,A.M. ; Bi,X.
Pub. info.: Clinical diagnostic systems : 21-22 January 2001, San Jose, USA.  pp.94-105,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4255
9.

Conference Proceedings
Conference Proceedings
9. Actinic EUVL mask blank defect inspection system
Jeong,S. ; Johnson,L.E. ; Lin,Y. ; Rekawa,S. ; Yan,P. ; Kearney,P.A. ; Tejnil,E. ; Underwood,J.H. ; Bokor,J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.298-308,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
10.

Conference Proceedings
Conference Proceedings
10. Defect control in As-rich GaAs
Specht,P. ; Jeong,S. ; Sohn,H. ; Luysberg,M. ; Prasad,A. ; Gebauer,J. ; Krausse-Rehberg,R. ; Weber,E.R.
Pub. info.: Defects in semiconductors, icds-19 : proceedings of the 19th International Conference on Defects in Semiconductors, Aveiro, Portugal, July 1997.  Part2  pp.951-956,  1997.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 258-263