1.

Technical Paper
Technical Paper
1. A Study of Vehicle Safety System - an Integration of Wireless Communication and Chassis Control.
Moon, T.-K. ; Jeong, S.-H. ; Oh, J.-N.
Pub. info.: 14th Asia Pacific Automotive Engineering Conference : SAE technical paper.  2007.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2007
2.

Conference Proceedings
Conference Proceedings
2. Optimum PEC conditions under resist heating effect reduction for 90-nm-node mask writing
Park, E.S. ; Lee, J.H, ; Park, D.I. ; Jeong, W.-G. ; Seo, S.K. ; Kim, S.-S. ; Choi, S.-S. ; Jeong, S.-H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.792-799,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
Park, D.-I. ; Seo, S.-K. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.-H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.634-640,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source
Kwon, H.-J. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Choi, B.-Y. ; Jeong, S.-H.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.60-65,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
5.

Conference Proceedings
Conference Proceedings
5. Negative chemically amplified resist in making mask for a logic device with high pattern density
Nam, K.-H. ; Cho, H.-J. ; Jeong, S.-H. ; Ahn, C.-N. ; Kim, H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.197-204,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130