1.

Conference Proceedings
Conference Proceedings
1. Novel x-ray mask structure with low out-of-plane distortion
Jeon,Y.J. ; Choi,S.-S. ; Kim,I.Y. ; Chung,H.B. ; Kim,B.W.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.511-517,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure
Choi,S.-S. ; Jeon,Y.J. ; Kim,J.-S. ; Chung,H.B. ; Lee,S.Y. ; Lee,J.H. ; Yoo,H.J.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.321-331,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
3.

Conference Proceedings
Conference Proceedings
3. Fabrication of 0.15 ｦﾌm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,
Choi,S.S. ; Jeon,Y.J. ; Lyu,J.-S. ; Yoo,H.J. ; Fabrizio,E.D. ; Grella,L. ; Gentili,M.
Pub. info.: Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea.  Part1  pp.15-16,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2778