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Conference Proceedings

1. Vacuum delay effect of CAR in mask fabrication

Kim,C.-H. ; Jeon,C.-U. ; Han,S.-J. ; Cho,W.-I. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.285-293, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Application of e-beam chemically amplified resist to devices below 0.18-μm node

Jeon,C.-U. ; Kim,C.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.160-163, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

3. Ecperimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Kim,C.-H. ; Jeon,C.-U. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.108-113, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186