Blank Cover Image

Factors Affecting Yield in the Aerotaxy Method for III-V Semiconductor Nanocrystal Preduction

Author(s):
Publication title:
AIChE 2000 ANNUAL MEETING
Title of ser.:
AIChE meeting [papers]
Ser. no.:
2000
Pub. Year:
2000
Paper no.:
22P
Pages:
7
Pub. info.:
New York: American Institute of Chemical Engineers
Language:
English
Call no.:
A08000
Type:
Conference Proceedings

Similar Items:

Deppert, K., Magnusson, M.H., Samuelson, L., Malm, J.-O., Svensson, C., Bovin, J.-O.

Electrochemical Society

Aquino-Class, Maria I., Ehrman, Sheryl H., Michael, Zachariah R.

American Institute of Chemical Engineers

Samuelson, Lars, Deppert, Knut, Malm, Jan-Olle

MRS - Materials Research Society

Alex Langrock, Sheryl H. Ehrman, Chunsheng Wang

American Institute of Chemical Engineers

Oluwatosin Ogunsola, Ratna Oetama, Tridib Bhowmick, Seonmin Kim, Sheryl Ehrman

American Institute of Chemical Engineers

Alex Langrock, Sheryl H. Ehrman, Chunsheng Wang

American Institute of Chemical Engineers

Sheryl H. Ehrman, R. Bertrum Diemer

American Institute of Chemical Engineers

Alex Langrock, Sheryl H. Ehrman, Chunsheng Wang

American Institute of Chemical Engineers

Sheryl H. Ehrman, R. Bertrum Diemer

American Institute of Chemical Engineers

Alex Langrock, Sheryl H. Ehrman, Chunsheng Wang

American Institute of Chemical Engineers

Sheryl H. Ehrman, R. Bertrum Diemer

American Institute of Chemical Engineers

Alex Langrock, Sheryl H. Ehrman, Chunsheng Wang

American Institute of Chemical Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12