1.

Conference Proceedings
Conference Proceedings
1. Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM
Jang, I.-Y. ; Lee, J.-Y. ; Kim, Y.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.246-252,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. New approach for quartz dry etching using hardmask for sub-90-nm photomask technology
Huh, S. ; Yoon, K.-S. ; Jang, I.-Y. ; Hwang, J.-H. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.19-27,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. New method for approaching the loading-free process for photomask Cr etching
Jang, I.-Y. ; Lee, J.-Y. ; Moon, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.59-65,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Research on the origin of particle generation in ICP plasma reactor
Lee, J.-Y. ; Kim, N.-K. ; Jang, I.-Y. ; Mun, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1111-1119,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256