1.

Conference Proceedings
Conference Proceedings
1. ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes
Mulkens,J. ; Stoeldraijer,J.M. ; Davies,G. ; Dierichs,M. ; Heskamp,B. ; Moers,M.H. ; George,R.A. ; Roempp,O. ; Glatzel,H. ; Wagner,C. ; Pollers,I. ; Jaenen,P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.506-521,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. 193-nm lithography on a full-field scanner
Goethals,A.-M. ; Pollers,I. ; Jaenen,P. ; Roey,F.Van ; Ronse,K. ; Heskamp,B. ; Davies,G.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.278-289,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Reduction of mask-induced CD errors by optical proximity correction
Randall,J. ; Tritchkov,A. ; Jonckheere,R. ; Jaenen,P. ; Ronse,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.124-130,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
4.

Conference Proceedings
Conference Proceedings
4. Status of ArF lithography for the 130-nm technology node
Ronse,K. ; Vandenberghe,G. ; Jaenen,P. ; Delvaux,C. ; Vangoidsenhoven,D. ; Roey,F.Van ; Pollers,I. ; Maenhoudt,M. ; Goethals,A.M. ; Pollentier,I.K. ; Vleeming,B. ; Schenau,K.van lngen ; Heskamp,B. ; Davies,G. ; Niroomand,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.410-422,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Front-end-of-line process development using 193-nm lithography
Pollentier,I.K. ; Ercken,M. ; Eliat,A. ; Delvaux,C. ; Jaenen,P. ; Ronse,K.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.56-67,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
6.

Conference Proceedings
Conference Proceedings
6. Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond
Op,de,Beeck,M. ; Vandenberghe,G. ; Jaenen,P. ; Zhang,F.-H. ; Delvaux,C. ; Richardson,P. ; van,Puyenbroeck,I. ; Ronse,K. ; Lamb,III,J.E. ; van,der,Hilst,J.B.C. ; van,Wingerden,J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.322-336,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
7.

Conference Proceedings
Conference Proceedings
7. NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels
Beeck,M.Op de ; Ronse,K. ; Ghandehari,K. ; Jaenen,P. ; Botermans,H. ; Finders,J. ; Lilygren,J.A. ; Baker,D.C. ; Vandenberghe,G. ; Bisschop,P.De ; Maenhoudt,M. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.320-332,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
8.

Conference Proceedings
Conference Proceedings
8. (Sub-) 100-nm gate patterning using 248-nm alternating PSM
Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.61-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409