1.

Conference Proceedings
Conference Proceedings
1. Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning
A. van Oosten ; P. Nikolsky ; J. Huckabay ; R. Goossens ; R. Naber
Pub. info.: Photomask technology 2007.  1  pp.67301L-1-67301L-7,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
2.

Conference Proceedings
Conference Proceedings
2. Litho-aware extraction for the 32nm double patterning node
J. Huckabay ; Q. Chen ; C. Thayer ; R. Naber
Pub. info.: Photomask technology 2007.  1  pp.67300W-1-67300W-12,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730