1.

Conference Proceedings
Conference Proceedings
1. Robust initialization for 2D/3D registration of knee implant models to single-plane fluoroscopy
J. Hermans ; P. Claes ; J. Bellemans ; D. Vandermeulen ; P. Suetens
Pub. info.: Medical imaging 2007, Image processing : 18-20 February 2007, San Diego, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6512
2.

Conference Proceedings
Conference Proceedings
2. A robust optimization strategy for intensity-based 2D/3D registration of knee implant models to single-plane fluoroscopy
J. Hermans ; P. Claes ; J. Bellemans ; D. Vandermeulen ; P. Suetens
Pub. info.: Medical imaging 2007, Image processing : 18-20 February 2007, San Diego, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6512
3.

Conference Proceedings
Conference Proceedings
3. Full field EUV lithography turning into a reality at IMEC
R. Jonckheere ; G. F. Lorusso ; A. M. Goethals ; J. Hermans ; B. Baudemprez ; A. Myers ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; K. Ronse
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
4.

Conference Proceedings
Conference Proceedings
4. Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
R. Jonckheere ; G. F. Lorusso ; A. Goethals ; K. Ronse ; J. Hermans ; R. D. Ruyter
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
5.

Conference Proceedings
Conference Proceedings
5. EUV lithography program at IMEC
A. M. Goethals ; R. Jonckheere ; G. F. Lorusso ; J. Hermans ; F. V. Roey ; A. Myers ; M. Chandhok ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; R. Gronheid ; B. Baudemprez ; K. Ronse
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
6.

Conference Proceedings
Conference Proceedings
6. Dependence of EUV mask printing performance on blank architecture
R. Jonckheere ; Y. Hyun ; F. Iwamoto ; B. Baudemprez ; J. Hermans
Pub. info.: Emerging lithographic technologies XII.  2  pp.69211W-1-69211W-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
7.

Conference Proceedings
Conference Proceedings
7. Imaging performance of the EUV alpha demo tool at IMEC
G. F. Lorusso ; J. Hermans ; A. M. Goethals ; B. Baudemprez ; F. Van Roey
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210O-1-69210O-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921