1.

Conference Proceedings
Conference Proceedings
1. Optimal mask characterization by Surrogate Wafer Print (SWaP) method
K. R. Kimmel ; I. Hoellein ; J. H. Peters ; P. Ackmann ; B. Connolly
Pub. info.: Photomask technology 2008.  1  pp.712219-1-712219-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
2.

Conference Proceedings
Conference Proceedings
2. Mask characterization for double patterning lithography
K. Bubke ; E. Cotte ; J. H. Peters ; R. de Kruif ; M. Dusa
Pub. info.: Photomask technology 2007.  1  pp.67301H-1-67301H-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
3.

Conference Proceedings
Conference Proceedings
3. Wafer inspection as alternative approach to mask defect qualification
C. Holfeld ; F. Katzwinkel ; U. Seifert ; A. Mothes ; J. H. Peters
Pub. info.: Photomask technology 2007.  2  pp.673023-1-673023-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
4.

Conference Proceedings
Conference Proceedings
4. EUV blank inspection
J. H. Peters ; C. Tonk ; D. Spriegel ; H.-S. Han ; W. Cho
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.67920F-1-67920F-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792