1.

Conference Proceedings
Conference Proceedings
1. Integrating immersion lithography in 45-nm logic manufacturing
M. Benndorf ; S. Warrick ; W. Conley ; D. Cruau ; D. DeSimone ; K. Mestadi ; V. Farys ; J. Gemmink
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Early look into device level imaging with beyond water immersion
W. Conley ; S. Warrick ; C. Garza ; P. Goirand ; J. Gemmink ; D. V. Steenwinckel
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. Extending immersion lithography to the 32-nm node
S. Warrick ; W. Conley ; V. Farys ; M. Benndorf ; J. Gemmink ; Y. Trouiller ; J. Belledent ; D. Jovanovic ; P. Gouraud
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520