1.

Conference Proceedings
Conference Proceedings
1. Metrology challenges for advanced lithography techniques
I. Englard ; P. Vanoppen ; J. Finders ; I. Minnaert-Janssen ; F. Duray ; J. Meessen ; G. Janssen ; O. Adan ; L. Gershtein ; R. Peltinov ; C. Masia ; R. Piech
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
M. Dusa ; J. Quaedackers ; O. F. A. Larsen ; J. Meessen ; E. van der Heijden ; G. Dicker ; O. Wismans ; P. de Haas ; K. van I. Schenau ; J. Finders ; B. Vleeming ; G. Storms ; P. Jaenen ; S. Cheng ; M. Maenhoudt
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. Masks for flash memory gates for the 45nm node: binary or attenuated?
E. van Setten ; A. Engelen ; J. Finders ; M. Dusa
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
4.

Conference Proceedings
Conference Proceedings
4. Double patterning for 32nm and below: an update
J. Finders ; M. Dusa ; B. Vleeming ; H. Megens ; B. Hepp
Pub. info.: Optical Microlithography XXI.  1  pp.692408-1-692408-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
5.

Conference Proceedings
Conference Proceedings
5. Random 65nm..45nm C/H printing using optimized illumination source and CD sizing by post processing
J. Finders ; E. Van der Heijden ; G.-J. Janssen ; R. Vangheluwe ; T. Shibata
Pub. info.: Optical Microlithography XXI.  2  pp.69242Y-1-69242Y-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
6.

Conference Proceedings
Conference Proceedings
6. An IntenCD map of a reticle as a feed-forward input to DoseMapper
M. Ben Yishai ; J. Finders ; R. Kazinczi ; A. Bleeker ; P. Luehrmann
Pub. info.: Photomask and next-generation lithography mask technology XV.  2  pp.70283H-1-70283H-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
7.

Conference Proceedings
Conference Proceedings
7. The lithography technology for the 32 nm HP and beyond
M. Dusa ; B. Arnold ; J. Finders ; H. Meiling ; K. van Ingen Schenau
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.702810-1-702810-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
8.

Conference Proceedings
Conference Proceedings
8. The flash memory battle: How low can we go?
E. van Setten ; O. Wismans ; K. Grim ; J. Finders ; M. Dusa
Pub. info.: Optical Microlithography XXI.  3  pp.69244I-1-69244I-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
9.

Conference Proceedings
Conference Proceedings
9. Characterizing the imaging performance of flash memory masks using AIMS
E. van Setten ; O. Wismans ; K. Grim ; J. Finders ; M. Duso
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.67920K-1-67920K-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792