1.

Technical Paper
Technical Paper
1. Transient Plasma Induced Production of OH and its Effects on Ignition in Atmospheric CH4-Air Quiescent Mixtures
C. Cathey ; J. Cain ; H. Wang ; M. Gundersen ; M. Ryan ; C. Carter
Pub. info.: AIAA meeting papers on disc.  2008.  Reston, Va..  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : Aerospace Sciences Meeting and Exhibit
Ser. no.: 2008
2.

Conference Proceedings
Conference Proceedings
2. Across-wafer CD uniformity control through lithography and etch process: experimental verification
Q. Zhang ; C. Tang ; J. Cain ; A. Hui ; T. Hsieh ; N. Maccrae ; B. Singh ; K. Poolla ; C. J. Spanos
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Realizing value-added metrology
B. Bunday ; P. Lipscomb ; J. Allgair ; D. Patel ; M. Caldwell ; E. Solecky ; C. Archie ; J. Morningstar ; B. J. Rice ; B. Singh ; J. Cain ; I. Emami ; B. Banke, Jr. ; A. Herrera ; V. Ukraintsev ; J. Schlessinger ; J. Ritchison
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
4.

Conference Proceedings
Conference Proceedings
4. Lithography process control using scatterometry metrology and semi-physical modeling
K. Lensing ; J. Cain ; A. Prabhu ; A. Vaid ; R. Chong ; R. Good ; B. LaFontaine ; O. Kritsun
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518