1.

Conference Proceedings
Conference Proceedings
1. Lithography simulation system for total CD control from design to manufacturing
Kotani, T. ; Ichikawa, H. ; Kobayashi, S. ; Nojima, S. ; Izuha, K. ; Tanaka, S. ; Inoue, S.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.219-229,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Impact of OPC aggressiveness on mask maufacturability
Tanaka, S. ; Inoue, S. ; Kotani, T. ; Izuha, K. ; Mori, I.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.23-32,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition
Izuha, K. ; Asano, M. ; Fujisawa, T. ; Inoue, S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.590-599,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Correcting lithography hot spots during physical-design implementation [6349-73]
Luk-Pat, G. T. ; Miloslavsky, A. ; Ikeuchi, A. ; Suzuki, H. ; Kyoh, S. ; Izuha, K. ; Tseng, F. ; Wen, L.
Pub. info.: Photomask Technology 2006.  pp.634920-634920,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
5.

Conference Proceedings
Conference Proceedings
5. Run-to-run CD error analysis and control monitoring of effective dose and focus
Asano, M. ; Fujisawa, T. ; Izuha, K. ; Inoue, S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.239-246,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
6.

Conference Proceedings
Conference Proceedings
6. CD control with effective exposure dose monitor technique in photolithography
Asano, M. ; Izuha, K. ; Fujisawa, T. ; Inoue, S.
Pub. info.: Optical Microlithography XV.  Part One  pp.280-287,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691