1.

Conference Proceedings
Conference Proceedings
1. SOI Device Technology for low-power logic and DRAM LSIs
Maegawa, S. ; Ipposhi, T. ; Yamaguchi, Y. ; Iwamatsu, T. ; Maeda, S. ; Oashi, T. ; Ueda, K. ; Shimomura, K. ; Nishimura, T.
Pub. info.: Proceedings of the Eighth International Symposium on Silicon-on-Insulator Technology and Devices.  pp.352-358,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-23
2.

Conference Proceedings
Conference Proceedings
2. Ultra-High-Speed and Low-Power SOI CMOS Technology with Body-Tied Hybrid Trench Isolation Structure
Hirano, Y. ; Ipposhi, T. ; Thai, D. H. ; Iwamatsu, T. ; Ikeda, T. ; Tsujiuchi, M. ; Maegawa, S. ; Inuishi, M. ; Ohji, Y.
Pub. info.: Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium.  pp.60-64,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-04
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of an advanced mask-writing system
Kubo, S. ; Hiruta, K. ; Sugiyama, M. ; Iwamatsu, T. ; Fujisawa, T. ; Morimoto, H.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.426-435,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of NLD mask dry etching system
Fujisawa, T. ; Iwamatsu, T. ; Hiruta, K. ; Morimoto, H. ; Sasaki, T. ; Yamashiro, K.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.147-152,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748