1.

Conference Proceedings
Conference Proceedings
1. Influence of mask induced polarization effects on a pattern printability
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.576-586,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Investigation of polarization effects on new mask materials
Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.587-598,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Current status of 157-nm lithography using a full-field scanner
Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1260-1268,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. Development and evaluation of an F2 laser for immersion interference lithography at 157 nm
Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1269-1278,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
5.

Conference Proceedings
Conference Proceedings
5. 157-nm lithography for 65-nm node SRAM-gate
Suganaga, T. ; Irie, S. ; Miyoshi, S. ; Kim, J.-H. ; Watanabe, K. ; Kurose, E. ; Furukawa, T. ; Hagiwara, T. ; Ishimaru, T. ; Itani, T.
Pub. info.: Optical Microlithography XVI.  Part One  pp.261-269,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
Suganaga, T. ; Lee, J.-W. ; Kurose, E. ; Ishimaru, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Cashmore, J.S. ; Gower, M.
Pub. info.: Optical Microlithography XVII.  pp.104-115,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. 157-nm resist assessment by a full-field scanner
Otoguro, A. ; Irie, S. ; Ishimaru, T. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.245-253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376