1.

Conference Proceedings
Conference Proceedings
1. Large assist feature phase-shift mask for sub-quarter-micrometer window pattern formation
Ishida,S. ; Yasuzato,T. ; Tanabe,H. ; Kasama,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.333-343,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Subresolution assist feature masks for 0.2-ｦﾌm window pattern formation
Yasuzato,T. ; Ishida,S. ; Tanabe,H. ; Andou,A. ; Kamata,T. ; Tonooka,Y. ; Shigemura,H.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.319-328,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
3.

Conference Proceedings
Conference Proceedings
3. Optical proximity correction of alternating phase-shift masks for 0.18-ｦﾌm KrF lithography
Yasuzato,T. ; Ishida,S. ; Shioiri,S. ; Tanabe,H. ; Kasama,K.
Pub. info.: Optical Microlithography X.  pp.751-762,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. High-performance neutron polarimeter NPOL2 for the(p,n)measurements at intermediate energies
Sakai,H. ; Wakasa,T. ; Otsu,H. ; Fujita,S. ; Nonaka,T. ; Okamura,H. ; Uesaka,T. ; Ohnishi,T. ; Hatanaka,K. ; Greenfield,M.B. ; Ishida,S. ; Sakamoto,N.
Pub. info.: International Conference Neutrons in Research and Industry.  pp.408-411,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2867
5.

Conference Proceedings
Conference Proceedings
5. Growth area control of InAs quantum dots for photonic-crystal-based optical devices by selective MOCVD
Tatebayashi,J. ; Ishida,S. ; Someya,T. ; Arakawa,Y.
Pub. info.: Physics and Simulation of Optoelectronic Devices IX.  pp.420-427,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4283
6.

Conference Proceedings
Conference Proceedings
6. Fabricating 100-nm line patterns with high-transmittance ArF attenuated phase-shift masks
Iwasaki,H. ; Ishida,S. ; Tonai,K. ; Nozue,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.81-93,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
7.

Conference Proceedings
Conference Proceedings
7. Improvement of resist pattern fidelity with partial attenuated phase-shift mask
Yasuzato,T. ; Ishida,S. ; Kasama,K.
Pub. info.: Optical Microlithography IX.  Part2  pp.496-507,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
8.

Conference Proceedings
Conference Proceedings
8. DOF enhancement effect of attenuated assist feature
Ishida,S. ; Hashimoto,S. ; Yasuzato,T. ; Kasama,K.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.34-42,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793