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24 results

Technical Paper

1. Model Based Investigation of Truck Driving Behaviour.

Irmscher, M. ; Butz, T. ; Pinnel, A. ; Benthake, K.

Pub. info.:	2005 SAE world congress : technical paper. 2005. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2005

Technical Paper

2. Driver Classification Using ve-DYNA Advanced Driver.

Irmscher, M. ; Ehmann, M.

Pub. info.:	2004 SAE world congress : technical paper. 2004. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2004

Conference Proceedings

3. Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z

Plontke, R. ; Bettin, L. ; Beyer, D. ; Butschke, J. ; Irmscher, M. ; Koepernik, C. ; Leibold, B. ; Vix, A. B. E. ; Voehringer, P.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.188-196, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

4. Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update

Schwersenz, A. ; Butschke, J. ; Feicke, A. ; Irmscher, M. ; Voehringer, P.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.201-212, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

5. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]

Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

6. Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]

Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

7. NIL template manufacturing using a variable. shaped e-beam writer and a new pCAR [6151-42]

Irmscher, M. ; Butschke, J. ; Hess, G. ; Koepernik, C. ; Letzkus, F. ; Renno, M. ; Sailer, H. ; Schulz, H. ; Schwersenz, A. ; Thompson, E.

Pub. info.:	Emerging Lithographic Technologies X. pp.615115-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

8. EUVL mask manufacturing: technologies and results [5992-83]

Letzkus, F. ; Butschke, J. ; Irmscher, M. ; Sailer, H. ; Dersch, U. ; Holfield, C.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59922A-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

9. Measures to achieve 20-nm IPL stenecil mask distortion

Hougeneder, E. ; Chalupka A. ; Lammer, T. ; Loeschner, H. ; Kamm, F.-M. ; Struck, T. ; Ehrmann, A. ; Kaesmaier, R. ; Wolter, A. ; Butschke, J. ; Irmscher, M. ; Letzkus, F. ; Springer, R.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.23-31, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

10.

Conference Proceedings

10. STEAG HamaTech resist coater ASR5000: tool concept and process results

Krauss, C. ; Dietze, U.U. ; Xu, F. ; Koepernik, C. ; Dress, P. ; Voehringer, P. ; Irmscher, M. ; Szekeresch, J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.684-693, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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Author: Irmscher, M.