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25 results

Conference Proceedings

1. Rectifiers for suppressing depolarization caused by differential transmission and phase shift in high NA lenses

Shribak,M.I. ; Inoue,S. ; Oldenbourg,R.

Pub. info.:	Polarization analysis, measurement, and remote sensing IV : 29-31 July 2001, San Diego, USA. pp.163-174, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4481

Conference Proceedings

2. Improvement of photomask repeater for 130-nm lithography

Kyoh,S. ; Inoue,S. ; Mori,I. ; Irie,N. ; Ishii,Y. ; Umatate,T. ; Kokubo,H. ; Hayashi,N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.277-286, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

3. Practical measurement system for determination of refractive index and thickness using low-coherence interferometry

Maruyama,H. ; Inoue,S. ; Ohmi,M. ; Ihara,K. ; Nakagawa,S. ; Haruna,M.

Pub. info.:	Optical engineering for sensing and nanotechnology (ICOSN '99) : 16-18 June 1999, Yokohama, Japan. pp.26-29, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3740

Conference Proceedings

4. Accurate proximity correction method with total-process proximity-based correction factor(TCF)

Hashimoto,K. ; Usui,S. ; Hasebe,S. ; Murota,M. ; Nakayama,T. ; Matsuoka,F. ; Inoue,S. ; Kobayashi,S. ; Yamamoto,K.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.224-233, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. Effective exposure-dose measurement in optical microlithography

Inoue,S. ; Fujisawa,T. ; Izuha,K.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.810-818, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

6. 130-nm KrF lithography for DRAM production with 0.68-NA scanner

Kawamura,E. ; Nagai,K. ; Kanemitsu,H. ; Tabata,Y. ; Inoue,S.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.927-934, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers

Kobayashi,S. ; Uno,T. ; Yamamoto,K. ; Tanaka,S. ; Kotani,T. ; Inoue,S. ; Higurashi,H. ; Watanabe,S. ; Yano,M. ; Ohki,S. ; Tsunakawa,K.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.614-621, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

8. Polysilicon TFT on plastics

Shimoda,T. ; Inoue,S. ; Utsunomiya,S.

Pub. info.:	Flat panel display technology and display metrology II : 22-23 January 2001, San Jose, [California] USA. pp.52-59, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4295

Conference Proceedings

9. Management of pattern generation system based on I-line stepper

Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K. ; Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.494-502, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Conference Proceedings

10. Measurement of effective source shift using a grating-pinhole mask

Sato,K. ; Tanaka,S. ; Fujisawa,T. ; Inoue,S.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.99-107, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

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Author: Inoue,S.