Innertsberger, G. ; Jurk, R. ; Felsner, J. ; Kakoschke, R. ; Yuwono, B. ; Schlosser, T. ; Krautschneider, W. ; Gschwandtner, A.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.589-, 1999. Warrendale, PA. MRS - Materials Research Society
Schwalke, U. ; Gruensfelder, C. ; Gschwandtner, A. ; Innertsberger, G. ; Kerber, M.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.597-, 1999. Warrendale, PA. MRS - Materials Research Society