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Conference Proceedings

1. Growth Mechanism of SiO2 Ultra-Thin Film on Si(100) by Highly Concentrated Ozone Supplied at Low and High Pressure Conditions

Ichimura, S. ; Nakamura, K. ; Kurokawa, A. ; Itoh, H. ; Koike, K.

Pub. info.:	The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.67-78, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-2

Conference Proceedings

2. Shift selectivity of the collinear holographic storage system [6282-51 ]

Shimura, T ; Ichimura, S. ; Ashizuka, Y. ; Fujimura, R.

Pub. info.:	Optical Data Storage 2006 : 23-26 April 2006, Montreal, Canada. pp.62820S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6282

Conference Proceedings

3. Surface Oxidation of Si(111) by High Purity Ozone and Negative Ions Produced by Rydberg Electron Transfer

Nonaka, H. ; Kurokawa, A. ; Nakamura, K. ; Ichimura, S.

Pub. info.:	Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.. pp.53-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	446

Conference Proceedings

4. ELECTRON BEAM INDUCED DEGRADATION OF 2DEG IN AlGaAs/GaAs HETEROSTRUCTURE

Wada, T. ; Kanayama, T. ; Ichimura, S. ; Sugiyama, Y. ; Komuro, M.

Pub. info.:	Physics and applications of defects in advanced semiconductors : symposium held November 29-December 1, 1993, Boston, Massachusetts, U.S.A.. pp.67-, 1994. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	325

Conference Proceedings

5. Ultrathin Silicon Dioxide Formation by Ozone on Ultraflat Si Surface

Kurokawa, A. ; Maeda, T. ; Sakamoto, K. ; Itoh, H. ; Nakamura, K. ; Koike, K. ; Moon, D. W. ; Ha, Y. H. ; Ichimura, S. ; Ando, A.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.21-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

6. Development of High Purity One ATM Ozone Source-Its Application to Ultrathin SiO2 Film Formation on Si Substrate

Koike, K. ; Inoue, G. ; Ichimura, S. ; Nakamura, K. ; Kurokawa, A. ; Nonaka, H.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.121-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

7. Comparison of High-Purity-Ozone Oxidation on Si(111) and Si(100)

Kurokawa, A. ; Ichimura, S. ; Moon, D. W.

Pub. info.:	Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.. pp.359-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	477

Conference Proceedings

8. Ozone Cleaning of Carbon-Related Contaminants on Si Wafers and Other Substrate Materials

Nonaka, H. ; Kurokawa, A. ; Ichimura, S. ; Moon, D. W.

Pub. info.:	Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.. pp.493-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	477

Conference Proceedings

9. Low Temperature Oxidation Processing With High Purity Ozone

Kurokawa, A. ; Ichimura, S. ; Kang, H. J. ; Moon, D. W.

Pub. info.:	Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.. pp.269-, 1996. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	429

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Conference Proceedings

10. Collinear technology for holographic versatile disc (HVD) system [6343-102]

Tan, X. ; Horimai, H. ; Shimura, T. ; Ichimura, S. ; Fujimura, R. ; Kuroda, K.

Pub. info.:	Photonics North 2006. pp.63432W-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6343

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Author: Ichimura, S.