1.

Conference Proceedings
Conference Proceedings
1. Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era
Kim, Y.-S. ; Hyun, Y.-S. ; Kong, K.-K. ; Kim, H. ; Choi, B.-H.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1388-1394,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Characterization and improvement of field CD uniformity for implementation of 0.15-μm technology device using KrF stepper
Hyun, Y.-S. ; Kim, D.-J. ; Koh, C.-W. ; Park, S.-N. ; Kwon, W.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.941-947,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040