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Conference Proceedings

1. TiSi-nitride-based attenuated phase-shift mask for ArF Lithography

Koo,S.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,L.-J. ; Park,K.-T. ; Shin,C.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.969-978, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. Comparison study of mask error effects for various mask-making processes

Eom,T.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,D.Y. ; Shin,C.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.734-745, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Accurate overlay control for 0.30-ｦﾌm i-line lithography

Kim,K.-Y. ; Hur,I.-B. ; Jang,G.-J. ; Choi,S.-H.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.379-387, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725