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11 results

Technical Paper

1. UAH MATHEMATICAL MODEL OF THE VARIABLE POLARITY PLASMA ARC WELDING SYSTEM CALCULATION

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-193926), pp.1-197, 1994. National Aeronautics and Space Adminstration

Technical Paper

2. GRAVITY WAVE INNITIATED CONVECTION

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-186868), pp.1-130, 1990. National Aeronautics and Space Adminstration

Technical Paper

3. CHARACTERISTICS AND PERFORMANCE OF THE VARIABLE POLARITY PLASMA ARC WELDING PROCESS USED IN THE SPACE SHUTTLE EXTERNAL TANK

Hung, R.J. ; Lee, C.C. ; Liu, J.W.

Pub. info.:

NASA Technical Reports. (NASA-CR-184226), pp.1-73, 1990. National Aeronautics and Space Adminstration

Technical Paper

4. INTERNAL WAVE MOTION Progress Report 1 Mar. - 31 Aug. 1986

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-178871), pp.1-59, 1986. National Aeronautics and Space Administration

Technical Paper

5. SPECTROSCOPIC STUDY OF COMBUSTION DIAGNOSTICS ON HYDROXYL RADICALS

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-186998), pp.1-35, 1990. National Aeronautics and Space Adminstration

Technical Paper

6. THE VARIABLE POLAROTY PLASMA ARC WELDING PROCESS: CHARACTERISTICS AND PERFORMANCE

Hung, R.J. ; Zhu, G.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-184259), pp.1-75, 1991. National Aeronautics and Space Adminstration

Technical Paper

7. SLOSHING DYNAMICS ON ROTATING HELIUM DEWAR TANK

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-1194403), pp.1-66, 1993. National Aeronautics and Space Adminstration

Technical Paper

8. MICROGRAVITY LIQUID PROPELLANT MANAGEMENT

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-184238), pp.1-181, 1990. National Aeronautics and Space Adminstration

Technical Paper

9. EXAMINATION OF VARIOUS TURBULENCE MODELS FOR APPLICATION IN LIQUID ROCKET THRUST CHAMBERS

Hung, R.J.

Pub. info.:

NASA Technical Reports. (NASA-CR-184406), pp.1-56, 1991. National Aeronautics and Space Adminstration

10.

Conference Proceedings

10. Dissolution inhibitors for 157-nm microlithography

Conley, W. ; Miller, D.A. ; Chambers, C.R. ; Osborn, B.P. ; Hung, R.J. ; Tran, H.V. ; Trinque, B.C. ; Pinnow, M.J. ; Chiba, T. ; McDonald, S. ; Zimmerman, P. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.69-75, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

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Author: Hung, R.J.