1.

Conference Proceedings
Conference Proceedings
1. Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography
Fang, S. P. ; Yang, H. ; Chang, H. ; Chiang, P. ; Lin, B. S.-M. ; Hung, K.-C.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1367-1376,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Improvement of 90nm KrF Cu process window by minimizing via deformation caused by low-frequency resonance of scanner projection lens
Fang, S.-P. ; Lin, B.S. ; Hung, K.-C.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.172-183,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
3.

Conference Proceedings
Conference Proceedings
3. Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
Cho, H.L. ; Lin, S.Y. ; Hsieh, F. ; Kroyan, A. ; Liu, H.-Y. ; Huang, J.H. ; Hsu, S.-H. ; Huang, I-H. ; Lin, B.S.-M. ; Hung, K.-C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.778-786,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Contact hole photo process improvement by multiple exposures with matched illumination settings
Yen, Y.-S. ; Huang, I-H. ; Hwang, J.-R. ; Hung, K.-C. ; Ku, C.-F. ; Chang, C.-H. ; Fang, C.-Y. ; Yen, P.W.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1530-1536,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond
Hsu, S.-H. ; Fang, S.-P. ; Huang, I.H. ; Lin, B.S. ; Hung, K.-C.
Pub. info.: Optical Microlithography XVII.  pp.1214-1224,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377