Hsu, L.T.H. ; Hung, J.C. ; Hsieh, H.-C. ; Rosenbusch, A. ; Falah, R. ; Blumberg, Y.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.357-363, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering