1.

Conference Proceedings
Conference Proceedings
1. Overview of optical systems for 30-nm-resolution lithography at EUV wavelenghts (Invited Paper)
Hudyma, R.M.
Pub. info.: International optical design conference 2002 : 3-5 June, 2002, Tucson, Arizona, USA.  pp.137-148,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4832
2.

Conference Proceedings
Conference Proceedings
2. Development of dioptric projection lenses for DUV lithography (Invited Paper)
Ulrich, W. ; Rostalski, H.-J. ; Hudyma, R.M.
Pub. info.: International optical design conference 2002 : 3-5 June, 2002, Tucson, Arizona, USA.  pp.158-169,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4832
3.

Conference Proceedings
Conference Proceedings
3. Aerial-image microscopes for the inspection of defects in EUV masks
Barty, A. ; Taylor, J.S. ; Hudyma, R.M. ; Spiller, E.A. ; Sweeney, D.W. ; Shelden, G.V. ; Urbach, J.-P.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1073-1084,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889