Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.268-277, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.135-145, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.776-785, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.315-322, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.352-360, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia. pp.152-157, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.319-328, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VII. pp.150-159, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering