1.

Conference Proceedings
Conference Proceedings
1. Dual anti-reflection layers for ARC/hard-mask applications [6154-144]
Huang, V. ; Wu, T. S. ; Yang, M. ; Lin, F. ; Yang, E. ; Yang, T. H. ; Chen, K. C. ; Ku, J. ; Lu, C. Y.
Pub. info.: Optical Microlithography XIX.  pp.61543Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Simulation-based mask quality control in a production environment
Pang, L. ; Chen, J.-H. ; Cai, L. ; Lee, D. ; Chu, B. ; Huang, V. ; Fang, T.-Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1087-1097,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375