1.

Conference Proceedings
Conference Proceedings
1. Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC
Roy, S. ; Van Den Broeke, D.J. ; Chen, J.F. ; Liebchen, A. ; Chen, T. ; Hsu, S.D. ; Shi, X. ; Socha, R.J.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.190-201,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
2.

Conference Proceedings
Conference Proceedings
2. Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Van Den Broeke, D.J. ; Laidig, T.L. ; Chen, J.F. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Socha, R.J. ; Dusa, M.V. ; Corcoran, N.P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.550-559,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Through-pitch low-k1 contact hole imaging with CPL technology
Wiaux, V. ; Bekaert, J. ; Chen, J.F. ; Hsu, S.D. ; Ronse, K.G. ; Socha, R.J. ; Vandenberghe, G. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.585-594,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)
Hsu, C. ; Chu, R. ; Chen, J.F. ; Van Den Broeke, D.J. ; Shi, X. ; Hsu, S.D. ; Wang, T.
Pub. info.: Optical Microlithography XV.  Part One  pp.76-88,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Investigation of phase variation impact on CPL PSM for low k1 imaging
Lin, C. ; Hsu, M. ; Hsieh, F. ; Lin, S.Y. ; Hsu, S.D. ; Shi, X. ; Van Den Broeke, D.J. ; Chen, J.F. ; Tang, F.C. ; Hsieh, W.A. ; Huang, C.Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.804-811,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
6.

Conference Proceedings
Conference Proceedings
6. Low k1 lithography patterning option for the 90-nm and 65-nm nodes
Hsu, S.D. ; Van Den Broeke, D.J. ; Shi, X. ; Hsu, M. ; Wampler, K.E. ; Chen, J.F. ; Yu, A. ; Yang, S.C. ; Hsieh, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.812-828,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
Hsu, S.D. ; Corcoran, N.P. ; Eurlings, M. ; Knose, W.T. ; Laidig, T.L. ; Wampler, K.E. ; Roy, S. ; Shi, X. ; Hsu, C.M. ; Chen, J.F. ; Finders, J. ; Socha, R.J. ; Dusa, M.V.
Pub. info.: Optical Microlithography XV.  Part One  pp.476-490,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
Socha, R.J. ; Van Den Broeke, D.J. ; Yu, L. ; Conley, W. ; Wu, W. ; Chen, J.F. ; Petersen, J.S. ; Gerold, D.J. ; van Praagh, J. ; Droste, R. ; Flagello, D.G. ; Hsu, S.D.
Pub. info.: Optical Microlithography XV.  Part One  pp.446-458,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
9.

Conference Proceedings
Conference Proceedings
9. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
10.

Conference Proceedings
Conference Proceedings
10. 65-nm full-chip implementation using double dipole lithography
Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.
Pub. info.: Optical Microlithography XVI.  Part One  pp.215-231,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040