1.

Conference Proceedings
Conference Proceedings
1. Millennium maskmaking
Hourd,A.C.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.2-9,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
2.

Conference Proceedings
Conference Proceedings
2. Application of a new approach to optical proximity correction
Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.639-647,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Improvements to mask inspectability by use of pattern proximity correction
Rosenbusch,A. ; Bailey,V. ; Eran,Y. ; Falah,R. ; Holmes,N.J. ; Hourd,A.C. ; McArthur,A. ; Staud,W.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.190-199,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
4.

Conference Proceedings
Conference Proceedings
4. Hierarchical e-beam proximity correction in mask making
Hofmann,U. ; Kalus,C.K. ; Rosenbusch,A. ; Jonckheere,R. ; Hourd,A.C.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.150-158,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
5.

Technical Paper
Technical Paper
5. A Novel Palladium Catalyst for Use in Vehicle Emissions Control
Cairns,J.A. ; Hourd,A.C. ; Scott,S.P. ; Thomson,J. ; Bradshaw,H. ; Goulding,P. ; McAlpine,I. ; Moles,P. ; Norman,C.
Pub. info.: Zirconium in emission control.  pp.87-92,  1997.  Society of Automotive Engineering, Inc.
Title of ser.: SAE special publication
Ser. no.: SP-1288
6.

Conference Proceedings
Conference Proceedings
6. Inductively coupled plasma etch of DUV MoSi photomasks:a designed study of etch chemistries and process results
Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Hourd,A.C.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.88-97,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
7.

Conference Proceedings
Conference Proceedings
7. Advanced mask cleaning for 0.20-ｦﾌm technology:an integrated user-supplier approach
Poschenrieder,R. ; Hay,B. ; Beier,M. ; Hourd,A.C. ; Stumer,H. ; Gairing,T.M.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.440-453,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546