1.

Conference Proceedings
Conference Proceedings
1. Multiparameter CD measurements using scatterometry
Raymond,C.J. ; Murnane,M.R. ; Prins,S.L. ; Naqvi,S.S.H. ; McNeil,J.R. ; Hosch,J.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.698-709,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
2.

Conference Proceedings
Conference Proceedings
2. Scatterometric sensor for PEB process control
Prins,S.L. ; McNeil,J.R. ; Naqvi,S.S.H. ; Hosch,J.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.710-719,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725