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12 results

Conference Proceedings

1. *DIGITAL CHEMICAL VAPOR DEPOSITION OF SILICON OXIDE-NITRIDE AND ITS SURFACE REACTION STUDY

Sakaue, H. ; Nakasako, T. ; Nakaune, K. ; Kusuki, T. ; Miki, A. ; Horiike, Y.

Pub. info.:	Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.. pp.169-180, 1993. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	284

Conference Proceedings

2. Issues and Future Trends For Advanced Dry Etching

Horiike, Y.

Pub. info.:	Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993. pp.263-282, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-13

Conference Proceedings

3. Fine/High Aspect Ratio of SiO2 Hole and Gap Etching

Horiike, Y. ; Ogata, M. ; Oshio, H. ; Chinzei, Y. ; Feurprier, Y. ; Takamura, Y. ; Ichiki, T.

Pub. info.:	ULSI process integration : proceedings of the first international symposium. pp.329-344, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-18

Conference Proceedings

4. Surface Analysis of Al Film Prepared from Dimethyl-Aluminum-Hydride

Sugiyama, M. ; Ogawa, H. ; Itoh, H. ; Aoyama, J. ; Horiike, Y. ; Komiyama, H. ; Shimogaki, Y.

Pub. info.:	CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition. pp.489-496, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-13

Conference Proceedings

5. *MICROFABRICATION TECHNOLOGIES FOR ADVANCED VLSI DEVICES

Horiike, Y. ; Yoshikawa, R. ; Okano, H. ; Nakase, M. ; Komano, H. ; Takigawa, T.

Pub. info.:	Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.. pp.17-26, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	75

Conference Proceedings

6. SINGLE-CRYSTAL SOLUTION SILICON ETCHING CHARACTERISTICS USING EXCIMER LASER Cl2 GAS

Arikado, T. ; Sekine, M. ; Okano, H. ; Horiike, Y.

Pub. info.:	Laser-controlled chemical processing of surfaces : symposium held November 1983 in Boston, Massachusetts, U.S.A.. pp.167-172, 1984. New York. North-Holland
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	29

Conference Proceedings

7. *MICROFABRICATION TECHNOLOGIES FOR ADVANCED VLSI DEVICES

Horiike, Y. ; Yoshikawa, R. ; Okano, H. ; Nakase, M. ; Komano, H. ; Takigawa, T.

Pub. info.:	Science and technology of microfabrication : symposium held December 4-5, 1986, Boston, Massachusetts, U.S.A.. pp.39-48, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	76

Conference Proceedings

8. TEM OBSERVATION OF THE DAMAGES IN HEAVILY ION-IMPLANTED FINE Si COLUMNS

Shingubara, S. ; Sukesako, H. ; Kawasaki, T. ; Inoue, K. ; Matusi, Y. ; Sakaue, H. ; Takahagi, T. ; Horiike, Y.

Pub. info.:	Beam-solid interactions for materials synthesis and characterization : symposium held November 28-December 2, 1994, Boston, Massachusetts, U.S.A.. pp.641-, 1995. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	354

Conference Proceedings

9. Cu Deposition Characteristics into Submicron Contact Holes Employing Self-Sputtering with a High Ionization Rate

Shingubara, S. ; Sano, A. ; Sakaue, H. ; Takahagi, T. ; Horiike, Y. ; Radzimski, Z. J. ; Posadowski, W. M.

Pub. info.:	Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.. pp.185-, 1996. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	427

10.

Conference Proceedings

10. MOLECULAR DYNAMICS OF VOID MOVEMENT DUETO ELECTROMIGATION

Shingubara, S. ; Fujii, T. ; Horiike, Y.

Pub. info.:	Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.263-270, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-6

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