1.

Conference Proceedings
Conference Proceedings
1. 25 nm immersion lithography at 193 nm wavelength
Choi, S.-H. ; Park, T.-H. ; Kim, E. ; Youn, H.-J. ; Lee, D.-Y. ; Ban, Y.-C. ; Je, A.-Y. ; Kim, D.-H. ; Hong, J.-S. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.141-147,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
Hong, J.-S. ; Park, C.-H. ; Kim, D.-H. ; Choi, S.-H. ; Ban, Y.-C. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.571-580,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Simulation-based critical-area extraction and litho-friendly layout design for low-k1 lithography
Choi, S.-H. ; Ban, Y.-C. ; Lee, K.-H. ; Kim, D.-H. ; Hong, J.-S. ; Kim, Y.-H. ; Yoo, M.-H. ; Kong, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.713-720,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377