1.

Conference Proceedings
Conference Proceedings
1. EVALUATION OF MEGASONIC CLEANING PROCESSES
Holsteyns, F. ; Riskin, A. ; Maes, A. ; Vereecke, G. ; Mertens, P.W.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.161-167,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. EVALUATION OF MEGASONIC CLEANING SYSTEMS FOR PARTICLE REMOVAL EFFICIENCY AND DAMAGING
Vereecke, G. ; Holsteyns, F. ; Veltens, J. ; Lux, M. ; Amauts, S. ; Kenis, K. ; Vos, R. ; Mertens, P. ; Heyns, M.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.145-152,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
3.

Conference Proceedings
Conference Proceedings
3. REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING
Fyen, W. ; Holsteyns, F. ; Lauerhaas, J. ; Bearda, T. ; Mertens, P. ; Heyns, M.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.91-101,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
4.

Conference Proceedings
Conference Proceedings
4. The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
Holsteyns, F. ; Cheung, L. ; Van Den Heuvel, D. ; Marcuccilli, G ; Simposon, G. ; Brun, R. ; Steinbach, A.. ; Fyen, W. ; Vangoidsenhoven, D. ; Merten, P. ; Maenhoudt, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152