1.

Conference Proceedings
Conference Proceedings
1. BEOL lithography for early development at the 65-nm node
DellaGuardia, R. ; Kwong, R.W. ; Li, W. ; Lawson, P. ; Burkhardt, M. ; Grauer, I.C. ; Wu, Q. ; Angyal, M. ; Hichri, H. ; Melville, I. ; Kumar, K. ; Lin, Y. ; Holmes, S.J. ; Varanasi, R. ; Spooner, T. ; McHerron, D.
Pub. info.: Optical Microlithography XVII.  pp.980-987,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
2.

Conference Proceedings
Conference Proceedings
2. Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Pfeiffer, D. ; Mahorowala, A.P. ; Babich, K. ; Medeiros, D.R. ; Petrillo, K.E. ; Angelopoulos, M. ; Huang, W.-S. ; Halle, S. ; Brodsky, C. ; Allen, S.D. ; Holmes, S.J. ; Kwong, R.W. ; Lang, R. ; Brock, P.J.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.136-143,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039