Micromachine technology for diffractive and holographic optics : 20-21 September 1999, Santa Clara, California. pp.98-105, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Organic photorefractives, photoreceptors, waveguides, and fibers : 21-23 July 1999, Denver, Colorado. pp.43-48, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Organic photorefractives, photoreceptors, waveguides, and fibers : 21-23 July 1999, Denver, Colorado. pp.32-42, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.228-242, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.80-99, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.116-124, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.36-48, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Organic photorefractives, photoreceptors, and nanocomposites : 31 July-1 August 2000, San Diego, USA. pp.95-103, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California. pp.150-158, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Xerographic photoreceptors and organic photorefractive materials II : 28-29 July 1997, San Diego, California. pp.134-141, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering