1.

Conference Proceedings
Conference Proceedings
1. Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography [6155-08]
Tay, A. ; Ho, W. -K. ; Hu, N. ; Tsai, K.Y. ; Zhou, Y.
Pub. info.: Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA.  pp.61550A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6155
2.

Conference Proceedings
Conference Proceedings
2. Real-time control of photoresist development process
Tay, A. ; Ho, W. -K. ; Kiew, C. -M. ; Zhou, Y. ; Lee, J. H.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.244-250,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
3.

Conference Proceedings
Conference Proceedings
3. Real-time control of photoresist absorption coefficient uniformity
Tay, A. ; Ho, W. -K. ; Wu, X. ; Tsai, K. -Y.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.187-195,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755