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11 results

Conference Proceedings

1. Extending OASIS for the unification of mask data representation

Sahouria, E. ; Schulze, S. ; Suzuki, T. ; Hirumi, J.

Pub. info.:	EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.51-62, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5835

Conference Proceedings

2. Unified mask data formats for EB writers

Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.660-671, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

3. GDS2NEO: high-compression data processing system for a new EB handling format

Kawase, H. ; Kamimoto, T. ; Ogasawara, H. ; Kuriyama, K. ; Hirumi, J. ; Yoshioka, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.638-647, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. Shot number analysis at 65-nm node mask writing using VSB writer

Hirumi, J. ; Kuriyama, K. ; Yoshioka, N. ; Yoshikawa, R. ; Hojo, Y. ; Matuzaka, T. ; Tanaka, K. ; Hoga, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.309-317, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Enhancement of unified mask data formats for EB writers

Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Houga, M.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1186-1194, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

6. Application of the unified mask data format based on OASIS for VSB EB writers [5992-195]

Suzuki, T. ; Hirumi, J. ; Suga, O.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59924F-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

7. Development of new stream format with GDSII upper compatibility and high compression rate

Kuriyama, K. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.83-93, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. The study of high-speed electron beam deflection technology for VSB writers

Hirumi, J. ; Yoshioka, N. ; Hoshi, H. ; Ando, H. ; Tsuchiya, S. ; Hoga, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.681-688, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

9. Investigation of an enhanced mask data preparation system using unified mask data formats

Suzuki, T. ; Kuriyama, K. ; Hirumi, J. ; Yoshioka, N. ; Kawase, H. ; Kamimoto, T.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.785-792, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

10.

Conference Proceedings

10. Improvement of unified mask data formats for EB writers

Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Hara, S. ; Kuriyama, K. ; Hoga, M. ; Watanabe, S.W. ; Kawase, H. ; Kamimoto, T. ; Kato, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.414-421, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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Author: Hirumi, J.