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High-resolution DUV inspection system for 150-nm generation masks

Author(s):
Tabata,M. ( Toshiba Corp. )
Tsuchiya,H.
Sanada,Y.
Nishizaka,T.
Hirazawa,H.
Kobayashi,N.
Nagai,H.
Watanabe,T.
Oohashi,K.
Inoue,H.
Nomura,T.
Ono,A.
7 more
Publication title:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3873
Pub. Year:
1999
Vol.:
Part1
Page(from):
138
Page(to):
146
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
Language:
English
Call no.:
P63600/3873
Type:
Conference Proceedings

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