1.

Conference Proceedings
Conference Proceedings
1. A new 193nm resist
Hirayama, T. ; Shiono, D. ; Matsumaru, S. ; Ogata, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Sakamizu, T. ; Yamaguchi, A. ; Shiraishi, H. ; Fukuda, H. ; Ueda, M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.122-130,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Effects of the Heat-Treatment Conditions on Microstructures of YbBa2Cu3O7-δ Superconducting Films Formed by the Dipping-Pyrolysis Process
Shibata, J. ; Yamagiwa, K. ; Hirabayashi, I. ; Hirayama, T. ; Ikuhara, Y.
Pub. info.: Materials science of novel oxide-based electronics : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.401-406,  2000.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 623
3.

Conference Proceedings
Conference Proceedings
3. Transmission Electron Microscopy Study of Thermal Barrier Coatings Fabricated by Electron Beam-Physical Vapor Deposition
Kato, T. ; Matsumoto, K. ; Ishiwata, Y. ; Hirayama, T. ; Matsubara, H. ; Ikuhara, Y. ; Saka, H.
Pub. info.: PRICM 5 : the Fifth Pacific Rim International Conference on Advanced Materials and Processing, November 2-5, 2004, Beijing, China.  pp.2877-2882,  2005.  Uetikon-Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 475-479(4)
4.

Conference Proceedings
Conference Proceedings
4. Molecular resists based on cholate derivatives for electron-beam lithography [6153-87]
Shiono, D. ; Hirayama, T. ; Hada, H. ; Onodera, J. ; Arai, T. ; Yamaguchi, A. ; Kojima, K. ; Shiraishi, H. ; Fukuda, H.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
5.

Conference Proceedings
Conference Proceedings
5. High-sensitivity 2.5-um pixel CMOS image sensor realized using Cu interconnect layers [6068-11]
Tatani, K. ; Enomoto, Y. ; Yamamoto, A. ; Goto, T. ; Abe, H. ; Hirayama, T.
Pub. info.: Sensors, Cameras, and Systems for Scientific/Industrial Applications VII.  pp.606809-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6068