Blank Cover Image

Correlation Between Annealing Temperature and Crystallinity of Si Films Prepared by Thermal Plasma Jet Crystallization Technique

Author(s):
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology--2006 : symposium held April 18-21, 2006, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
910
Pub. Year:
2007
Page(from):
583
Page(to):
590
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998667 [1558998667]
Language:
English
Call no.:
M23500/910
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Formation of Si Nanocrystals in SiOx Films Induced by Thermal Plasma Jet Annealing and Its Application to Floating Gate Memory

T. Okada, S. Higashi, H. Kaku, H. Furukawa, S. Miyazaki

Electrochemical Society
7 Conference Proceedings High Efficiency Activation of Phosphorus Atoms in 4H-SiC by Atmospheric Pressure Thermal Plasma Jet Annealing

H. Hanafusa, K. Maruyama, R. Ishimaru, S. Higashi

Trans Tech Publications
2 Conference Proceedings In-situ Monitoring of Si Wafer Temperature during Millisecond Rapid Thermal Annealing

H. Furukawa, S. Higashi, T. Okada, H. Kaku, H. Murakami

Electrochemical Society
8 Conference Proceedings A Novel Technique for In Situ Monitoring of Crystallinity and Temperature During Rapid Thermal Annealing of Thin Si/Si-Ge Films on Quartz/Glass

Subramanian, V., Degertekin, F. L., Dankoski, P., Khuri-Yakub, B. T., Saraswat, K. C.

MRS - Materials Research Society
3 Conference Proceedings High Rate Growth of Highly-Crystallized Ge Films on Quartz from VHF Inductively-Coupled Plasma of GeH4+H2

T. Sakata, K. Makihara, H. Deki, S. Higashi, S. Miyazaki

Trans Tech Publications
9 Conference Proceedings Low Temperature Crystallization of Bismuth Layer-Structured Ferroelectric Thin Films Using Lead Titanate Sol-Gel Templating Technique and Their Electrical …

Karasawa, Junichi, Kijima, Takeshi, Natori, Eiji, Shimoda, Tatsuya

Materials Research Society
4 Academic Journal Development of Thermal Plasma Jet Induced Annealing Technology and Its Application to Electronic Device Fabrication

Seiichiro HIGASHI, 東 清一郎

真空協会
10 Conference Proceedings Characterization of Electronic Charged States of Nickel Silicide Nanodots Using AFM/ Kelvin Probe Technique

R. Nishihara, K. Makihara, Y. Kawaguchi, M. Ikeda, H. Murakami, S. Higashi, S. Miyazaki

Trans Tech Publications
5 Conference Proceedings Raman and EELS Studies on Nanocrystalline Diamond Prepared in a Low Pressure Inductively Coupled Plasma

Okada, Katsuyuki, Kimoto, Koji, Komatsu, Shojiro, Matsumoto, Seiichiro

Materials Research Society
11 Conference Proceedings Properties of Cat-CVD Silicon Nitride Films and Their Application as Passivation Films

Okada, Shinya, Matsumura, Hideki

MRS - Materials Research Society
6 Conference Proceedings *THE PLASMA DEPOSITION OF SEMICONDUCTOR MULTILAYER STRUCTURES

Hirose, Masataka, Miyazaki, Seiichi

Materials Research Society
12 Conference Proceedings Effect of Crystallization on High-Temperature Plastic Flow and Ductility in Pre-Annealed Zr-Al-Ni-Cu Bulk Metallic Glass

Y. Takigawa, J. Kobata, H. Tsuda, K. Higashi

Trans Tech Publications
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12