1.

Conference Proceedings
Conference Proceedings
1. THE ROLE OF ELECTRON AND HOLE TRAPS IN THE DEGRADATION AND BREAKDOWN OF THERMALLY GROWN SiO2 LAYERS
Heyns, M. M. ; De Keersmaecker, R. F.
Pub. info.: SiO[2] and its interfaces : symposium held November 30-December 5, 1987, Boston, Massachusetts, U.S.A..  pp.205-218,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 105
2.

Conference Proceedings
Conference Proceedings
2. Effect of Cl in Gate Oxidation
Mertens, P. W. ; McGeary, M. J. ; Schaekers, M. ; Sprey, H. ; Vermeire, B. ; Depas, M. ; Meuris, M. ; Heyns, M. M.
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.89-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477
3.

Conference Proceedings
Conference Proceedings
3. Outplating of Metallic Contaminants on Silicon Wafers from Diluted Acid Solutions
Rotondaro, A. L. P. ; Hurd, T. Q. ; Schmidt, H. F. ; Teerlinck, I. ; Heyns, M. M. ; Claeys, C.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.183-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
4.

Conference Proceedings
Conference Proceedings
4. Modeling Soft Breakdown of Ultrathin Gate Oxide Layers
Houssa, M. ; Mertens, P. W. ; Heyns, M. M.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.307-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
5.

Conference Proceedings
Conference Proceedings
5. Silicon Surface Metal Contamination Measurements Using Grazing-Emission XRF Spectrometry
Gendt, S. de ; Kenis, K. ; Baeyens, M. ; Mertens, P. W. ; Heyns, M. M. ; Wiener, G. ; Kidd, S. J. ; Knotter, D. M. ; Bokx, P. K. de
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.397-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477
6.

Conference Proceedings
Conference Proceedings
6. Scalability of MOCVD-Deposited Hafnium Oxide
Elshocht, S. Van ; Carter, R. ; Caymax, M. ; Claes, M. ; Conard, T. ; Date, L. ; Gendt, S. De ; Kaushik, V. ; Kerber, A. ; Kluth, J. ; Lujan, G. ; Petry, J. ; Pique, D. ; Richard, O. ; Rohr, E. ; Shimamoto, Y. ; Tsai, W. ; Heyns, M. M.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.59-64,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
7.

Conference Proceedings
Conference Proceedings
7. NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES
Heyns, M. M. ; Verhaverbeke, S. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. ; Kubota, M. ; Philipossian, A. ; Dillenbeck, K. ; Graf, D. ; Schnegg, A. ; Blank, R. de
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.35-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
8.

Conference Proceedings
Conference Proceedings
8. HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES
Verhaverbeke, S. ; Bender, H. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. F. ; Heyns, M. M.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.457-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
9.

Conference Proceedings
Conference Proceedings
9. Effect of Cl in Gate Oxidation
Mertens, P. W. ; McGeary, M. J. ; Schaekers, M. ; Sprey, H. ; Vermeire, B. ; Depas, M. ; Meuris, M. ; Heyns, M. M.
Pub. info.: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.149-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 473