Kramer, U. ; Fleischer, G. ; Marschner, T. ; Hornig, S. ; Weichert, H. ; Hetzer, D.
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Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA. pp.615509-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Lee, M. K. ; Yedur, S. ; Hetzer, D. ; Tavassoli, M. ; Baik, K.
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EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810Z-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Chen, L.-J. ; Ke, C.-M. ; Yu, S.S. ; Gau, T.-S. ; Chen, P. ; Ku, Y.-C. ; Lin, B.J. ; Engelhard, D. ; Hetzer, D. ; Yang, J.Y. ; Barry, K.A. ; Yap, L. ; Yang, W.
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Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.568-576, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Ke, C.-M. ; Yu, S.-S. ; Wang, Y.-H. ; Chou, Y.-J. ; Chen, J.-H. ; Lee, B.-H. ; Chu, H.-Y. ; Lin, H.-T. ; Gau, T.-S. ; Lin, C.-H. ; Ku, Y.-C. ; Lin, B.J. ; Huang, J. ; Hsu, J.J. ; Liu, V. ; Hetzer, D. ; Yap, L. ; Yang, W. ; Araki, K.
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Metrology, Inspection, and Process Control for Microlithography XVIII. pp.597-604, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering