1.

Conference Proceedings
Conference Proceedings
1. SPC tracking and run monitoring of a CD SEM
Allgair,J. ; Ruehle,D.G. ; Elliott,R.C. ; Herrera,P.P. ; Miller,J.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.243-251,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Alternative method for monitoring an in-line CD SEM
Herrera,P.P. ; Dick,S.A. ; Allgair,J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.557-564,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
3.

Conference Proceedings
Conference Proceedings
3. Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization
Allgair,J.A. ; Benoit,D.C. ; Drew,M. ; Hershey,R.R. ; Litt,L.C. ; Herrera,P.P. ; Whitney,U.K. ; Guevremont,M. ; Levy,A. ; Lakkapragada,S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.462-471,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344